A resistance macromodel for deep-submicron process epi-type substrate based on the 2D device simulation is presented.
摘要提出了一种基于二维器件模拟深亚米工艺外延衬底电阻宏模。
A resistance macromodel for deep-submicron process epi-type substrate based on the 2D device simulation is presented.
摘要提出了一种基于二维器件模拟深亚米工艺外延衬底电阻宏模。
The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.
通过电实验,观察到水合二氧化硅具有米亚米纳米三次结构。
声明:以上例句、词性分类均由互联网资源成,部分未经过人工审核,其表达内容亦不代表本软件观点;若发现问题,欢迎向我们指正。