Because the distribution of molecular director was not affected by lamellar decorating after quench, chemical etching and SEM technique were used to reveal disclination and director patterns.
由于样品淬火后晶片装饰在织构
而不影
取向矢的布,因而可以用化学刻蚀和
镜技术揭示其向错和取向矢图。
Because the distribution of molecular director was not affected by lamellar decorating after quench, chemical etching and SEM technique were used to reveal disclination and director patterns.
由于样品淬火后晶片装饰在织构而不影取向矢的布,因而可以用化学刻蚀和镜技术揭示其向错和取向矢图。
声明：以
、词性
类均由互联网资源自动生成，部未经过人工审核，其表达内容亦不代表本软件的观点；若发现问题，欢迎向我们指正。
