diselenide

1.A specific thin-film technology is based on the use of Copper Indium Diselenide (CIS) material.

还有一种基于使用铜铟硒化合物（CIS)材料的特殊薄膜技术。

2.A 77.5% of reduction in deposit formation could be obtained when the multiplex additive of tetralin/ tetralone binary donor and diphenyl diselenide was added into n-dodecane.

复合添加比单一试效果，二供二苯二硒的复合添加可减少77.5%的裂解沉积。