1.A new fabrication method for hollow microneedle array is proposed with three times exposures in deep X-ray lithography of synchrotron radiation and the development procedure.
摘要提出了一种新的空心列加工方法,利用三次同步辐射曝光和显影过程来加工。
2.The microneedle array assembly can be mounted on planar or nonplanar surface or even on flexible objects,it also can be used for synthetic drugs,therapeutic proteins and vaccines.